The influence of an ultra-high resistivity Ta underlayer on perpendicular magnetic anisotropy in Ta/Pt/Co/Pt heterostructures

Author:

Zhang Wei12345,Jia Xiaoxiong12345,Wang Rui12345,Liu Huihui12345,Xiao Zhengyu12345,Quan Zhiyong12345ORCID,Xu Xiaohong12345ORCID

Affiliation:

1. Key Laboratory of Magnetic Molecules and Magnetic Information Materials of Ministry of Education

2. The School of Chemistry and Materials Science

3. Shanxi Normal University

4. Linfen 041004

5. China

Abstract

Thin films with perpendicular magnetic anisotropy (PMA) play an essential role in the development of technologies due to their excellent thermal stability and potential application in devices with high density, high stability, and low energy consumption.

Funder

National Natural Science Foundation of China

Publisher

Royal Society of Chemistry (RSC)

Subject

General Chemical Engineering,General Chemistry

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