Highly transparent microcrystalline silicon carbide grown with hot wire chemical vapor deposition as window layers in n-i-p microcrystalline silicon solar cells
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2739335
Reference17 articles.
1. Low temperature chemical vapor deposition growth of β-SiC on (100) Si using methylsilane and device characteristics
2. Low temperature deposition of nanocrystalline silicon carbide thin films
3. Highly conductive microcrystalline silicon carbide films deposited by the hot wire cell method and its application to amorphous silicon solar cells
4. Low temperature deposition of nanocrystalline silicon carbide films by plasma enhanced chemical vapor deposition and their structural and optical characterization
5. Low substrate temperature deposition of crystalline SiC using HWCVD
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