Low temperature deposition of nanocrystalline silicon carbide thin films
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.126350
Reference14 articles.
1. Growth mechanism of microcrystalline silicon obtained from reactive plasmas
2. Growth control and properties of microcrystallized silicon films deposited by hydrogen plasma sputtering
3. Conduction mechanism of hydrogenated nanocrystalline silicon films
4. Improved Electrical and Transport Characteristics of Amorphous Silicon by Enriching with Microcrystalline Silicon
5. Optical properties of microcrystalline materials
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