GaAs metal‐semiconductor field‐effect transistor with extremely low resistance nonalloyed ohmic contacts using an InAs/GaAs superlattice
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.101803
Reference3 articles.
1. Extremely low resistance nonalloyed ohmic contacts on GaAs using InAs/InGaAs and InAs/GaAs strained‐layer superlattices
2. Molecular beam epitaxy growth of (Al, Ga)As/GaAs heterostructures
3. Contact Resistance and Contact Resistivity
Cited by 13 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Ohmic Contacts to II–VI and III–V Compound Semiconductors;Processing of Wide Band Gap Semiconductors;2000
2. Ohmic contacts to GaAs epitaxial layers;Critical Reviews in Solid State and Materials Sciences;1997-09
3. Characteristics of Nonalloyed Pseudomorphic High Electron Mobility Transistors Using InAs/InxGa1-xAs(x=1→0)/AlyGa1-yAs(y=0→0.3) Contact Structures;Japanese Journal of Applied Physics;1997-06-15
4. GaAs MESFET's on a truly insulating buffer layer: demonstration of the GaAs on insulator technology;IEEE Electron Device Letters;1997-03
5. Influence of metal/n‐InAs/interlayer/n‐GaAs structure on nonalloyed ohmic contact resistance;Journal of Applied Physics;1994-11
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