Beryllium doping in Ga0.47In0.53As and Al0.48In0.52As grown by molecular‐beam epitaxy
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.329349
Reference14 articles.
1. Ga<inf>0.47</inf>In<inf>0.53</inf>As: A ternary semiconductor for photodetector applications
2. Ultimate low-loss single-mode fibre at 1.55 μm
3. 1.67 µm Ga0.47In0.53As/InP DH Lasers Double Cladded with InP by LPE Technique
4. Planar type vapor-phase epitaxial In0.53Ga0.47As photodiode
5. Zn‐diffused back‐illuminated p‐i‐n photodiodes in InGaAs/InP grown by molecular‐beam epitaxy
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1. Comprehensive study of the structural, optical and electrical properties of InAlAs: Mg films lattice matched to InP grown by MOVPE;Journal of Materials Science: Materials in Electronics;2017-08-23
2. The Structural and Optical Properties of Be-Doped GaAs Grown by MBE;Advanced Materials Research;2015-07
3. Optical properties of Si-doped and Be-doped InAlAs lattice-matched to InP grown by molecular beam epitaxy;Journal of Applied Physics;2013-09-14
4. Electrical and optical characteristics of molecular beam epitaxial Be-doped In0.53Ga0.26Al0.21As layers grown lattice-matched on InP (100) substrates;Materials Science and Engineering: B;1999-06
5. The effects of beryllium doping in InGaAlAs layers grown by molecular beam epitaxy;Journal of Crystal Growth;1998-10
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