Effect of argon addition on plasma parameters and dust charging in hydrogen plasma
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4898858
Reference64 articles.
1. Atom and Ion Chemistry in Low Pressure Hydrogen DC Plasmas
2. Optical emission spectroscopic investigation of hydrogen plasma used for modification of electrical properties of multi-crystalline silicon
3. Diagnostics of the magnetized low‐pressure hydrogen plasma jet: Molecular regime
4. Characterization of Cu surface cleaning by hydrogen plasma
Cited by 12 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Spectroscopic analysis of pulsed-mode plasma with argon addition for diamond growth;Diamond and Related Materials;2024-10
2. Experimental investigation of an electronegative cylindrical capacitively coupled geometrically asymmetric plasma discharge with an axisymmetric magnetic field;Physics of Plasmas;2024-08-01
3. Role of plasma process gas on permeate flux augmentation of cellulose nitrate membrane for mud water treatment;Scientific Reports;2024-03-19
4. Plasma sheath with multi‐species of positive ions and surface produced negative ions;Contributions to Plasma Physics;2023-06-13
5. Development of Ni-Co supported on SBA-15 catalysts for non-thermal plasma assisted co-conversion of CO2 and CH4: Results and lessons learnt;Carbon Capture Science & Technology;2022-12
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3