Optical and electrical properties of titanium dioxide films with a high magnitude dielectric constant grown onp‐Si by metalorganic chemical vapor deposition at low temperature
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.111898
Reference22 articles.
1. InP/SiO2MIS structure
2. Inversion layers on InP
3. InP–SiO2 m.i.s. structure with reduced interface state density near conduction band
4. Electrical properties of SiO2 and Si3N4 dielectric layers on InP
5. The deposition of insulators onto InP using plasma-enhanced chemical vapour deposition
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