Orientation dependent etching of polycrystalline diamond by hydrogen plasma
Author:
Affiliation:
1. Division of Materials Science, Nara Institute of Science and Technology, 8916-5,Takayama, Ikoma, Nara 630-0192, Japan
2. Faculty of Science and Engineering, Kindai University, 3-4-1, Kowakae, Higashiosaka, Osaka 577-8502, Japan
Abstract
Funder
KAKENHI, Japan Society for Promotion of Science
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
https://aip.scitation.org/doi/pdf/10.1063/5.0090715
Reference35 articles.
1. Hydrogenating Effect of Single-Crystal Diamond Surface
2. Hydrogen-terminated diamond surfaces and interfaces
3. Origin of Surface Conductivity in Diamond
4. C-H surface diamond field effect transistors for high temperature (400 °C) and high voltage (500 V) operation
5. Durability-enhanced two-dimensional hole gas of C-H diamond surface for complementary power inverter applications
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