Photoluminescence and x‐ray properties of heteroepitaxial gallium arsenide on silicon
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.336353
Reference14 articles.
1. Growth and properties of GaAs/AlGaAs on nonpolar substrates using molecular beam epitaxy
2. Summary Abstract: Molecular beam epitaxial growth and material properties of GaAs and AlGaAs on Si(100) and Ge(100)
3. Molecular beam epitaxy of GaAs and AlGaAs on Si
4. The effect of elastic strain on energy band gap and lattice parameter in III‐V compounds
5. An evaluation of the thermal and elastic constants affecting GaAs crystal growth
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1. Improvement of the crystallinity of a GaAs epitaxial film grown on a Si substrate using a Si/SiGe/Ge buffer layer;Thin Solid Films;1996-06
2. Improvement of the crystallinity of GaAs epitaxial layers grown on Si substrates assisted by electron beam irradiation;Thin Solid Films;1996-06
3. Photoluminescence studies on GaAs/Ge/Si and GaAs/SiGe/Ge/Si heterostructures after annealing and hydrogenation;Physica Status Solidi (a);1993-10-16
4. Photoluminescence of GaAs epitaxial layers on Si with growth assisted by electron‐beam irradiation;Journal of Applied Physics;1993-09-15
5. MOVPE growth of (Al)GaAs on GaAs and Si for photovoltaic applications;Microelectronic Engineering;1992-05
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