Ultrananocrystalline diamond film deposition by direct-current plasma assisted chemical vapor deposition using hydrogen-rich precursor gas in the absence of the positive column
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.3533764
Reference25 articles.
1. NANOCRYSTALLINE DIAMOND FILMS
2. Synthesis and characterization of highly-conducting nitrogen-doped ultrananocrystalline diamond films
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5. The 8-inch free-standing CVD diamond wafer fabricated by DC-PACVD
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