Infrared laser-based monitoring of the silane dissociation during deposition of silicon thin films
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.3141520
Reference21 articles.
1. Plasma silane concentration as a determining factor for the transition from amorphous to microcrystalline silicon in SiH4/H2discharges
2. Highly efficient microcrystalline silicon solar cells deposited from a pure SiH4 flow
3. Probing the phase composition of silicon films in situ by etch product detection
4. Silane dissociation products in deposition discharges
5. Transient depletion of source gases during materials processing: a case study on the plasma deposition of microcrystalline silicon
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