Defect generation in ultrathin silicon dioxide films produced by anode hole injection
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1320460
Reference8 articles.
1. Substrate hole current and oxide breakdown
2. Anode hole injection and trapping in silicon dioxide
3. Mechanism for stress‐induced leakage currents in thin silicon dioxide films
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