Plasma CVD of hydrogenated boron-carbon thin films from triethylboron
Author:
Affiliation:
1. Department of Physics, Chemistry and Biology, Linköping University, SE-581 83 Linköping, Sweden
2. European Spallation Source ERIC, P.O. Box 176, SE-221 00 Lund, Sweden
3. Mid-Sweden University, SE-85170 Sundsvall, Sweden
Funder
European Spallation Source
Knut och Alice Wallenbergs Stiftelse
Publisher
AIP Publishing
Subject
Physical and Theoretical Chemistry,General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.5006886
Reference26 articles.
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1. Thin-film (Al)BCN materials synthesized by sequential precursor pulses to mimic atomic layer deposition;AIP Advances;2023-02-01
2. Conformal chemical vapor deposition of boron-rich boron carbide thin films from triethylboron;Journal of Vacuum Science & Technology A;2023-01
3. Identification and Analysis of the Impurities for Triethylboron by GC‐MS Method;Propellants, Explosives, Pyrotechnics;2022-03-03
4. Thermodynamic calculations for the chemical vapor deposition of hexagonal boron nitride using triethylboron, ammonia, and hydrogen;Journal of Crystal Growth;2021-10
5. Role of generated free radicals in synthesis of amorphous hydrogenated boron carbide from orthocarborane using argon bombardment: a ReaxFF molecular dynamics study;Materials Research Express;2020-03-16
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