Thermodynamic calculations for the chemical vapor deposition of hexagonal boron nitride using triethylboron, ammonia, and hydrogen-Reference-Cited by-同舟云学术

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Thermodynamic calculations for the chemical vapor deposition of hexagonal boron nitride using triethylboron, ammonia, and hydrogen

Published:2021-10 Issue: Volume:572 Page:126283
ISSN:0022-0248
Container-title:Journal of Crystal Growth
language:en
Short-container-title:Journal of Crystal Growth

Author:

Jean-Remy Philip M.,Webler Bryan A.,Pistorius Petrus C.,Davis Robert F.

Funder

The National GEM Consortium

Publisher

Elsevier BV

Subject

Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics

Reference41 articles.

1. Direct-bandgap properties and evidence for ultraviolet lasing of hexagonal boron nitride single crystal

2. Boron nitride substrates for high-quality graphene electronics

3. Preparation and Properties of Boron Nitride Films by Metal Organic Chemical Vapor Deposition

4. Hexagonal BN epitaxial growth on (0001) sapphire substrate by MOVPE

5. Self-terminating growth in hexagonal boron nitride by metal organic chemical vapor deposition

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Advances in fabrication, physio-chemical properties, and sensing applications of non-metal boron nitride and boron carbon nitride-based nanomaterials;Surfaces and Interfaces;2023-10

2. Chemical vapor deposition of sp²-boron nitride on mechanically polished pyrolytic boron nitride substrates;Journal of Vacuum Science & Technology A;2022-07

3. Flow-modulated deposition of sp²-boron nitride using diborane and ammonia on chemomechanically polished (0001) 4H-SiC substrates;Journal of Vacuum Science & Technology A;2022-03

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