Si3N4/Si/In0.05Ga0.95As/n–GaAs metal–insulator–semiconductor devices
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.364130
Reference37 articles.
1. The interaction of stoichiometry, mechanical stress, and interface trap density in LPCVD Si-rich SiNx;Si structures
2. The interaction of stoichiometry, mechanical stress, and interface trap density in LPCVD Si-rich SiNx;Si structures
3. The properties of GaAs-Al2O3 and InP-Al2O3 interfaces and the fabrication of MIS field-effect transistors
4. The properties of GaAs-Al2O3 and InP-Al2O3 interfaces and the fabrication of MIS field-effect transistors
5. Gate‐width dependence of radiation‐induced interface traps in metal/SiO2/Si devices
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1. High-κ dielectrics and advanced channel concepts for Si MOSFET;Journal of Materials Science: Materials in Electronics;2008-05-02
2. Evidence of electron and hole inversion in GaAs metal-oxide-semiconductor capacitors with HfO2 gate dielectrics and α-Si∕SiO2 interlayers;Applied Physics Letters;2006-07-24
3. A model for capacitance reconstruction from measured lossy MOS capacitance voltage characteristics;Semiconductor Science and Technology;2002-12-24
4. Characteristics of Si3N4/GaAs metal-lnsulator-semiconductor interfaces with coherent Si/Al0.3Ga0.7As interlayers;Journal of Electronic Materials;1997-09
5. Minority-carrier characteristics of SiNx/GaAs metal–insulator–semiconductor structures with Si/Ge interlayers;Applied Physics Letters;1997-09
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