Polymer film cutting and ablative etching using a 1‐kHz XeCl laser
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.96337
Reference8 articles.
1. Self‐developing photoetching of poly(ethylene terephthalate) films by far‐ultraviolet excimer laser radiation
2. Kinetics of the ablative photodecomposition of organic polymers in the far ultraviolet (193 nm)
3. Direct etching of polymeric materials using a XeCl laser
4. Self‐developing UV photoresist using excimer laser exposure
5. Direct high-resolution excimer laser photoetching
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