Vacancy-mediated diffusion in biaxially strained Si-Reference-Cited by-同舟云学术

Vacancy-mediated diffusion in biaxially strained Si

Published:2011-01-17 Issue:3 Volume:98 Page:031908
ISSN:0003-6951
Container-title:Applied Physics Letters
language:en
Short-container-title:Appl. Phys. Lett.

Author:

Caliste Damien,Rushchanskii Konstantin Z.,Pochet Pascal

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Link

http://aip.scitation.org/doi/pdf/10.1063/1.3548547

Reference19 articles.

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5. Sb-enhanced diffusion in strainedSi1−xGex: Dependence on biaxial compression

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