Effects of the deposition rate on growth modes of Ag islands on the hydrogen-terminated Si(111)-(1 × 1) surface: The role of surface energy and quantum size effect-Reference-Cited by-同舟云学术

Effects of the deposition rate on growth modes of Ag islands on the hydrogen-terminated Si(111)-(1 × 1) surface: The role of surface energy and quantum size effect

Published:2017-09-05 Issue:9 Volume:122 Page:095303
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:J. Appl. Phys.

Author:

Kang Jungmin¹,Eguchi Toyoaki¹,Kawamoto Erina¹,Matsushita Stephane Yu¹,Haga Kenya¹,Kanagawa Shino¹,Wawro Andrzej²,Czajka Ryszard³^ORCID,Kato Hiroki¹,Suto Shozo¹^ORCID

Affiliation:

1. Department of Physics, Graduate School of Science, Tohoku University, Sendai 980-8578, Japan

2. Institute of Physics, Polish Academy of Sciences, Aleja Lotników 32/46, PL-02668 Warsaw, Poland

3. Institute of Physics, Faculty of Technical Physics, Poznań University of Technology, ul. Piotrowo 3, 60-965 Poznań, Poland

Funder

Grant-in-Aid for Scientifc Research from the Ministry of Education, Culture, Sports, Science and Technology (MEXT)

Iwatani Naoji Foundation

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Reference36 articles.

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2. Clustering on surfaces

3. J. A. Venables , Introduction to Surface and Thin Film Processes ( Cambridge University Press, London, 2000).

4. I. V. Markov , Crystal Growth for Beginners ( World Scientific Publishing, Singapore, 2003).

5. Crystal surfaces in and out of equilibrium: A modern view

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