Optical properties of monoclinic HfO2 studied by first-principles local density approximation + U approach
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4818765
Reference26 articles.
1. Gate oxides in 50 nm devices: thickness uniformity improves projected reliability
2. Boron diffusion and penetration in ultrathin oxide with poly-Si gate
3. Optical and electrical properties of plasma-oxidation derived HfO 2 gate dielectric films
4. Study of HfO2 films prepared by ion-assisted deposition using a gridless end-hall ion source
5. Effect of Hf metal predeposition on the properties of sputtered HfO2/Hf stacked gate dielectrics
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3. Unraveling the effect of sulfur doping into electronic and optical performance of monoclinic hafnium dioxide (m-HfO2: S): an (DFT + U) insights report;Applied Physics A;2022-05-14
4. Density Functional Theory (DFT) Analysis on the Structural, Electronic, and Optical Properties of Monoclinic HfO2;2022 IEEE VLSI Device Circuit and System (VLSI DCS);2022-02-26
5. Band Structure Engineering and Optical Properties of Pristine and Doped Monoclinic Zirconia (m-ZrO2): Density Functional Theory Theoretical Prospective;ACS Omega;2021-10-27
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