Characterization and stabilization of an electron‐cyclotron resonance plasma source using an automatic microwave tuner
Author:
Publisher
AIP Publishing
Subject
Instrumentation
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1142884
Reference9 articles.
1. Microwave Plasma Etching
2. Reactive Ion Beam Etching Using a Broad Beam ECR Ion Source
3. A high‐current density and long lifetime ECR source for oxygen implanters
4. Electron cyclotron resonance microwave discharges for etching and thin‐film deposition
5. Potential applications of an electron cyclotron resonance multicusp plasma source
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