Effect of NH3plasma treatment of gate nitride on the performance of amorphous silicon thin‐film transistors
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.346354
Reference16 articles.
1. A large-area high-resolution active-matrix color LCD addressed by a-Si TFT's
2. Chemical vapor deposition of a silicon nitride layer with an excellent interface by NH3plasma treatment
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4. Improved material properties of amorphous silicon from silane by fluorine implantation: Application to thin‐film transistors
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