Position dependent microparticle charge in a spatiotemporal afterglow plasma
Author:
Affiliation:
1. Department of Applied Physics, Eindhoven University of Technology 1 , P.O. Box 513, Eindhoven 5600 MB, The Netherlands
2. VDL Enabling Technologies Group 2 , P.O. Box 80038, Eindhoven 5600 JW, The Netherlands
Abstract
Funder
This study received financial support from VDL Enabling Technologies Group
Publisher
AIP Publishing
Subject
Condensed Matter Physics
Link
https://pubs.aip.org/aip/pop/article-pdf/doi/10.1063/5.0139815/16797297/033704_1_online.pdf
Reference51 articles.
1. Ten years of plasma crystals - From ICPIG (Bochum) to ICPIG (Greifswald);Contrib. Plasma Phys.,2004
2. Complex plasmas - New discoveries in strong coupling physics;Appl. Phys. B,2007
3. Complex plasma research on the International Space Station;Plasma Phys. Controlled Fusion,2019
4. Phase transitions in a dusty plasma with two distinct particle sizes;Adv. Space Res.,2008
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