Kinetics of damage production in silicon during self‐implantation
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.337140
Reference14 articles.
1. A model for the formation of amorphous Si by ion bombardment
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5. The crystalline-to-amorphous transition in ion-bombarded silicon
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