Stoichiometry and phase purity of Pb(Zr,Ti)O3 thin films deposited by metal organic chemical vapor deposition
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2337258
Reference22 articles.
1. A 64-Mb Embedded FRAM Utilizing a 130-nm 5LM Cu/FSG Logic Process
2. Low-temperature integration of lead-based ferroelectric capacitors on Si with diffusion barrier layer
3. Correlation between oxidation resistance and crystallinity of Ti–Al as a barrier layer for high-density memories
4. Control of Leakage Resistance in Pb(Zr,Ti)O3 Thin Films by Donor Doping
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