Electron cyclotron resonance plasma ion source for material depositions
Author:
Publisher
AIP Publishing
Subject
Instrumentation
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1148938
Reference19 articles.
1. Electron Cyclotron Resonance Plasma Deposition Technique Using Raw Material Supply by Sputtering
2. Oxide film deposition by radio frequency sputtering with electron cyclotron resonance plasma stimulation
3. A Few Techniques for Preparing Conductive Material Films for Sputtering-Type Electron Cyclotron Resonance Microwave Plasma
4. Gas density reduction effects in magnetrons
5. Effect of anode bias on the index of refraction of Al2O3 thin films deposited by dc S‐Gun magnetron reactive sputtering
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