Oxide film deposition by radio frequency sputtering with electron cyclotron resonance plasma stimulation-Reference-Cited by-同舟云学术

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Oxide film deposition by radio frequency sputtering with electron cyclotron resonance plasma stimulation

Published:1995-09 Issue:5 Volume:13 Page:2427-2434
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Matsuoka Morito,Tohno Shun‐ichi

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.579484

Cited by 12 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. High performance indium oxide nanoribbon FETs: mitigating devices signal variation from batch fabrication;Nanoscale Advances;2019

2. Note: Easy-to-maintain electron cyclotron resonance (ECR) plasma sputtering apparatus featuring hybrid waveguide and coaxial cables for microwave delivery;Review of Scientific Instruments;2016-06

3. The study on characterizations of SrTiO3 thin films with different growth temperatures;Superlattices and Microstructures;2014-12

4. Preparation of high quality strontium titanate based thin films by ECR plasma sputtering;Surface and Coatings Technology;2003-06

5. Influence of RF Power Supply on Electron-Cyclotron-Resonance Plasma with Mirror Confinement for SrTiO3Thin Film Formation;Japanese Journal of Applied Physics;2000-08-15

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