Nanoscale characterization of unintentional doping of atomically thin layered semiconductors by scanning nonlinear dielectric microscopy
Author:
Affiliation:
1. Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba, Sendai 980-8577, Japan
Funder
Japan Society for the Promotion of Science
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/5.0016462
Reference65 articles.
1. Electric Field Effect in Atomically Thin Carbon Films
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