Continuous-time photoelectron spectroscopy for monitoring monochromatic soft x-ray photodissociation of CF3Cl adsorbed on Si(111)−7×7
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2794430
Reference15 articles.
1. Synchrotron radiation‐induced etching of a carbon film in an oxygen gas
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1. Polarization Dependence in the Carbon K-Edge Photofragmentation of MAPDST Photoresist: An Experimental and Theoretical Study;The Journal of Physical Chemistry C;2018-11-26
2. Adsorption of formic acid on Si(111)7 × 7 at room temperature: a valence band photoemission and Si2p photodesorption study;Surface and Interface Analysis;2014-11-18
3. Monochromatic soft X-ray-induced reactions of CCl2F2 adsorbed on Si(111)-7×7 near the Si(2p) edge;Surface Science;2012-07
4. Continuous-time photon-stimulated desorption spectroscopy studies on soft x-ray-induced reactions of CF3Br adsorbed on Si(111)-7×7;The Journal of Chemical Physics;2011-10-28
5. Monochromatic soft-x-ray-induced reactions of CF2Cl2adsorbed on Si(111)-7 × 7 studied by continuous-time photon-stimulated desorption spectroscopy near the F(1s) edge;Journal of Physics: Condensed Matter;2011-10-13
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