Polarization Dependence in the Carbon K-Edge Photofragmentation of MAPDST Photoresist: An Experimental and Theoretical Study

Author:

Moura Cleverson A. S.1,Belmonte Guilherme K.1,Segala Maximiliano1ORCID,Gonsalves Kenneth E.2,Weibel Daniel E.1ORCID

Affiliation:

1. Institute of Chemistry, Universidade Federal do Rio Grande do Sul-UFRGS, Avenida Bento Gonçalves 9500, 91501-970 Porto Alegre, Rio Grande do Sul, Brazil

2. School of Basic Sciences, Indian Institute of Technology Mandi, 175001 Mandi, Himachal Pradesh, India

Funder

Conselho Nacional de Desenvolvimento Cient?fico e Tecnol?gico

Coordena??o de Aperfei?oamento de Pessoal de N?vel Superior

Laborat?rio Nacional de Luz S?ncrotron

Publisher

American Chemical Society (ACS)

Subject

Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials

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