A method to investigate the electron scattering characteristics of ultrathin metallic films by in situ electrical resistance measurements
Author:
Publisher
AIP Publishing
Subject
Instrumentation
Link
http://aip.scitation.org/doi/pdf/10.1063/1.3186059
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1. In situ resistivity measurements during the atomic layer deposition of ZnO and W thin films
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5. Growth and properties of Co/Al–Ox/Ni(80)Fe(20) trilayers monitored in-situ during deposition process
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1. A load-lock compatible system for in situ electrical resistivity measurements during thin film growth;Review of Scientific Instruments;2016-02
2. Improvement of interfacial electron scattering by introduced NiFe nanoparticles;Rare Metals;2012-03-30
3. Atomic Layer Deposition of Ruthenium Films on Strontium Titanate;Journal of Nanoscience and Nanotechnology;2011-09-01
4. Atomic Layer Deposition of Ruthenium Films from (Ethylcyclopentadienyl)(pyrrolyl)ruthenium and Oxygen;Journal of The Electrochemical Society;2011
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