Overcoming the compensation of acceptors in GaN:Mg by defect complex formation

Author:

Xie Zijuan12,Buckeridge John3ORCID,Catlow C. Richard A.24ORCID,Zhang Anping1,Keal Thomas W.5ORCID,Sherwood Paul5,Lu You5,Woodley Scott M.2ORCID,Sokol Alexey A.2ORCID

Affiliation:

1. International School of Microelectronics, Dongguan University of Technology 1 , 523808 Dongguan, People’s Republic of China

2. Department of Chemistry, Kathleen Lonsdale Materials Chemistry, University College London 2 , WC1 HOAJ London, United Kingdom

3. School of Engineering, London South Bank University 3 , SE1 0AA London, United Kingdom

4. School of Chemistry, Cardiff University 4 , Park Place, CF10 1AT Cardiff, United Kingdom

5. Scientific Computing Department, STFC Daresbury Laboratory 5 , Daresbury, Warrington WA4 4AD, United Kingdom

Abstract

In GaN:Mg, the MgGa acceptor is compensated extensively by the formation of nitrogen vacancies (VN) and Mg interstitials (Mgi). However, we show that such compensation can be overcome by forming two kinds of Mg-rich complexes: one that contains VN and the other that contains only MgGa and Mgi. Such complexing not only neutralizes VN and Mgi but also forms better complex acceptors that have lower formation energies and smaller hole localization energies than isolated MgGa. Our results help explain the different doping behaviors in samples grown by different methods.

Funder

Engineering and Physical Sciences Research Council

Basic and Applied Basic Research Foundation of Guangdong Province

Publisher

AIP Publishing

Subject

General Engineering,General Materials Science

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