Thickness dependence of dielectric constant of alumina films based on first-principles calculations

Author:

Fukushima Shogo12,Kalia Rajiv K.2,Nakano Aiichiro2ORCID,Shimojo Fuyuki1ORCID,Vashishta Priya2ORCID

Affiliation:

1. Department of Physics, Kumamoto University, Kumamoto 860-8555, Japan

2. Collaboratory for Advanced Computing and Simulations, Department of Physics and Astronomy, Department of Computer Science, Department of Chemical Engineering and Materials Science, Department of Quantitative and Computational Biology, University of Southern California, Los Angeles, California 90089-0242, USA

Abstract

Optoelectronic properties of devices made of two-dimensional materials depend largely on the dielectric constant and thickness of a substrate. To systematically investigate the thickness dependence of dielectric constant from first principles, we have implemented a double-cell method based on a theoretical framework by Martyna and Tuckerman [J. Chem. Phys. 110, 2810 (1999)] and therewith developed a general and robust procedure to calculate dielectric constants of slab systems from electric displacement and electric field, which is free from material-specific adjustable parameters. We have applied the procedure to a prototypical substrate, Al2O3, thereby computing high-frequency and static dielectric constants of a finite slab as a function of the number of crystalline unit-cell layers. We find that two and four layers are sufficient for the high-frequency and static dielectric constants of (0001) Al2O3 slabs to recover 90% of the respective bulk values computed by a Berry-phase method. This method allows one to estimate the thickness dependence of dielectric constants for various materials used in emerging two-dimensional nanophotonics, while providing an analytic formula that can be incorporated into photonics simulations.

Funder

Japan Society for the Promotion of Science

Japan Science and Technology Agency

National Science Foundation

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Cited by 4 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3