Thermal electron attachment to NO. II. Temperature dependence and implication of the attachment to van der Waals molecules
Author:
Publisher
AIP Publishing
Subject
Physical and Theoretical Chemistry,General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.456524
Reference24 articles.
1. Thermal electron attachment to NO. I. The mechanism and the three‐body rate constants
2. Rates of Electron Removal by Recombination, Attachment, and Ambipolar Diffusion in Nitric Oxide Plasmas
3. Ambipolar Diffusion and Electron Attachment in Nitric Oxide in the Temperature Range 196 to 358°K
4. Electron attachment and detachment in nitric oxide
5. Mechanism of thermal electron attachment to O2: Isotope effect studies with18O2in rare gases and some hydrocarbons
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