Thermal electron attachment to NO. I. The mechanism and the three‐body rate constants
Author:
Publisher
AIP Publishing
Subject
Physical and Theoretical Chemistry,General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.454999
Reference19 articles.
1. Rates of Electron Removal by Recombination, Attachment, and Ambipolar Diffusion in Nitric Oxide Plasmas
2. Ambipolar Diffusion and Electron Attachment in Nitric Oxide in the Temperature Range 196 to 358°K
3. Recombination, Attachment, and Ambipolar Diffusion of Electrons in Photo-Ionized NO Afterglows
4. ELECTRON DECAY FOLLOWING d-c. DISCHARGE IONIZATION IN NO AND NO–Ne MIXTURES
5. Attachement électronique non dissociatif sur l'oxygène et l'oxyde azotique en phase gazeuse
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1. O2(1Δ) production and gain in plasma pumped oxygen–iodine lasers: consequences of NO and NO2additives;Journal of Physics D: Applied Physics;2007-08-03
2. Thermal Electron Capture in the Mixtures of Halocarbons and Environmental Gases;The Journal of Physical Chemistry A;1999-12-16
3. Enhanced formation of negative ions by electron attachment to highly excited molecules in a flowing afterglow plasma;Journal of Applied Physics;1998-09-15
4. THE ROLE OF VAN DER WAALS COMPLEXES IN THE THERMALELECTRON ATTACHMENT PROCESSES IN THE GAS PHASE;Progress in Reaction Kinetics and Mechanism;1998-03-01
5. Enhanced electron attachment to highly excited molecules using a plasma mixing scheme;Applied Physics Letters;1997-12-22
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