Self-masking controlled by metallic seed layer during glass dry-etching for optically scattering surfaces
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.3290969
Reference21 articles.
1. Deep reactive ion etching of Pyrex glass using SF6 plasma
2. Reactive ion etching of quartz and Pyrex for microelectronic applications
3. Deep dry etching of borosilicate glass using SF6 and SF6/Ar inductively coupled plasmas
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5. Smooth surface glass etching by deep reactive ion etching with SF[sub 6] and Xe gases
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