Atomic layer deposition and properties of mixed Ta2O5 and ZrO2 films-Reference-Cited by-同舟云学术

Atomic layer deposition and properties of mixed Ta2O5 and ZrO2 films

Published:2017-02 Issue:2 Volume:7 Page:025001
ISSN:2158-3226
Container-title:AIP Advances
language:en
Short-container-title:AIP Advances

Author:

Kukli Kaupo¹²,Kemell Marianna¹,Vehkamäki Marko¹^ORCID,Heikkilä Mikko J.¹,Mizohata Kenichiro³^ORCID,Kalam Kristjan²,Ritala Mikko¹,Leskelä Markku¹^ORCID,Kundrata Ivan⁴,Fröhlich Karol⁴

Affiliation:

1. Department of Chemistry, University of Helsinki, P.O. Box 55, FI-00014 Helsinki, Finland

2. Institute of Physics, University of Tartu, W. Ostwald 1, 50411 Tartu, Estonia

3. Accelerator Laboratory, Department of Physics, University of Helsinki, P.O. Box 43 (A.I. Virtasen aukio 1), FI-00014 Helsinki, Finland

4. Institute of Electrical Engineering, Slovak Academy of Sciences, Dúbravská Cesta 9, 841 04 Bratislava, Slovakia

Funder

Finnish Excellence Centre for Atomic Layer Deposition

Eesti Teadusagentuur (Estonian Research Council)

Eesti Teaduste Akadeemia (Estonian Academy of Sciences)

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.4975928

Reference70 articles.

1. Synthesis and Characterization of Ta2O5−ZrO2 Systems: Structure, Surface Acidity, and Catalytic Properties.

2. Novel studies on the thermoelectro-mechanical properties of tantala-doped zirconia refractories

3. The hot corrosion resistance of 20 mol% YTaO4 stabilized tetragonal zirconia and 14 mol% Ta2O5 stabilized orthorhombic zirconia for thermal barrier coating applications

4. Phase stability and hot corrosion behavior of ZrO2–Ta2O5 compound in Na2SO4–V2O5 mixtures at elevated temperatures

5. Niobia and tantala codoped orthorhombic zirconia ceramics

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