Multilevel nonvolatile photomemory with long-term robust optical retention based on photoinduced depolarization

Author:

Zhu Xiaoxiao12,Lu Wei12,Zhang Chi12,Cui Xuan12,Ning Jing12ORCID,Zhang Jincheng12,Wang Dong123,Hao Yue12ORCID

Affiliation:

1. The State Key Discipline Laboratory of Wide Band Gap Semiconductor Technology, Xidian University 1 , Xi'an 710071, China

2. Shaanxi Joint Key Laboratory of Graphene, Xidian University 2 , Xi'an 710071, China

3. Xidian-Wuhu Research Institute 3 , Wuhu 241000, China

Abstract

Ferroelectric memory is promising for implementing emerging information technologies, including digital storage and analog computing. Two-dimensional (2D) ferroelectric materials retain robust room-temperature ferroelectric characteristics at the single-layer limit, surpassing traditional ferroelectric materials. This characteristic enables further advancements in device miniaturization to meet the growing demand. Herein, we manufactured a metal–insulator–ferroelectric–semiconductor field-effect transistor (MIFSFET) using a 2D ferroelectric material (α-In2Se3), which displayed nonvolatile characteristics. Based on the mechanism of photoinduced depolarization in a ferroelectric semiconductor, the MIFSFET device can be used as a photomemory, capable of storing an optical image for up to 1000 s with minimal information loss and can achieve a multistate photoresponse induced by an optical pulse. Moreover, it can function as a ferroelectric memory, with an on/off ratio exceeding 106, endurance of above 3000 cycles, and stable retention. The proposed MIFSFET demonstrated excellent optical image sensing and memory functions, presenting a feasible approach for developing efficient visual systems in the future.

Funder

General Program of Nature Science Foundation of China

Fundamental Research Funds for the Central Universities

The National Science Fund for Distinguished Young Scholars

Xi'an Key Industry Core Project

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

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