The plasma oxidation of titanium thin films to form dielectric layers
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.344290
Reference10 articles.
1. C-V characteristics of metal-titanium dioxide-silicon capacitors
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4. A simple chemical vapour deposition method for depositing thin TiO2 films
5. Electrical Properties of Rutile (TiO2) Thin Film
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