Low‐energy electron scattering cross sections of halofluorocarbons
Author:
Publisher
AIP Publishing
Subject
Physical and Theoretical Chemistry,General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.466665
Reference29 articles.
1. Etching and film formation in CF3Br plasmas: some qualitative observations and their general implications
2. Selective etching of Si relative to SiO2without undercutting by CBrF3plasma
3. Comparison of CF4/O2 and CF2Cl2/O2 plasmas used for the reactive ion etching of single crystal silicon
4. Negative ion formation in CF2Cl2, CF3Cl and CFCl3 following low energy (0—10 eV) impact with near monoenergetic electrons
5. Catalytic destruction of ozone by chlorofluorocarbons and partial restoration by methane in large laboratory experiments
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