Design and performance of a versatile, cost-effective microwave electron cyclotron resonance plasma source for surface and thin film processing
Author:
Publisher
AIP Publishing
Subject
Instrumentation
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1150420
Reference4 articles.
1. Electron cyclotron resonance microwave discharges for etching and thin‐film deposition
2. A compact, resonant cavity, five centimeter, multicusp, ECR broad‐beam ion source
3. Characterization of electron cyclotron resonance source plasma for etching and deposition
4. The role of neutral oxygen radicals in the oxidation of Ag films
Cited by 61 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Ion concentration ratio measurements of ion beams generated by a commercial microwave electron cyclotron resonance plasma source;Review of Scientific Instruments;2023-11-01
2. Quantitative Measurement of Positive and Negative Ion Species Ejected from a Li–O–H Surface by Hydrogen and Noble Gas Ion Irradiation;Journal of Fusion Energy;2023-08-18
3. Quantitative measurement of positive and negative ion species ejected from a Li-O-H surface by hydrogen and noble gas ion irradiation;2023-04-11
4. First Experimental Confirmation of the CH3O + H2CO → CH3OH + HCO Reaction: Expanding the CH3OH Formation Mechanism in Interstellar Ices;The Astrophysical Journal Letters;2022-06-01
5. Methane Formation in Cold Regions from Carbon Atoms and Molecular Hydrogen;The Astrophysical Journal;2022-03-01
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3