Comment on “The effects of radio-frequency bias on electron density in an inductively coupled plasma reactor” [J. Appl. hys. 102, 113302 (2007)]-Reference-Cited by-同舟云学术

Comment on “The effects of radio-frequency bias on electron density in an inductively coupled plasma reactor” [J. Appl. hys. 102, 113302 (2007)]

Published:2022-10-21 Issue:15 Volume:132 Page:156101
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Du M. Q.¹^ORCID,Ding Z. F.¹^ORCID

Affiliation:

1. School of Physics, Dalian University of Technology, Dalian 116024, China

Abstract

Sobolewski et al. [J. Appl. Phys. 102, 113302 (2007)] obtained the complex responses of electron density to the long-pulsed RF bias and proposed the gas composition effect as a key underlying factor. In this Comment, the consistent explanations on the complex responses indicate that the ignored slow wall heating should be taken into account.

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

https://aip.scitation.org/doi/pdf/10.1063/5.0101636

Reference30 articles.

1. The effects of radio-frequency bias on electron density in an inductively coupled plasma reactor

2. Effects of rf-bias power on plasma parameters in a low gas pressure inductively coupled plasma

3. Origin of electrical signals for plasma etching end point detection: Comparison of end point signals and electron density

4. Effect of bias application to plasma density in weakly magnetized inductively coupled plasma

5. Fluid simulation of the bias effect in inductive/capacitive discharges

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1. Response to “Comment on ‘The effects of radio-frequency bias on electron density in an inductively coupled plasma reactor’” [J. Appl. Phys. 132, 156101 (2022)];Journal of Applied Physics;2022-10-21