Organometallic chemical vapor deposition of tungsten metal, and suppression of carbon incorporation by codeposition of platinum-Reference-Cited by-同舟云学术

Organometallic chemical vapor deposition of tungsten metal, and suppression of carbon incorporation by codeposition of platinum

Published:1992-10-12 Issue:15 Volume:61 Page:1793-1795
ISSN:0003-6951
Container-title:Applied Physics Letters
language:en
Short-container-title:Appl. Phys. Lett.

Author:

Niemer Burkhard,Zinn Alfred A.,Stovall William K.,Gee Paul E.,Hicks Robert F.,Kaesz Herbert D.

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Link

http://aip.scitation.org/doi/pdf/10.1063/1.108402

Reference11 articles.

1. Low‐temperature chemical vapor deposition of tungsten from tungsten hexacarbonyl

2. Photochemical deposition of thin films from the metal hexacarbonyls

3. Effect of Laser Heating on Compositions of Films Deposited from the Metal Hexacarbonyls

4. Low-Temperature Organometallic Chemical Vapor Deposition of Transition Metals

Cited by 10 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Thermal decomposition of tungsten hexacarbonyl: CVD of W-containing films under Pd codeposition and VUV assistance;physica status solidi (c);2015-06-05

2. W chemical-vapor deposition using (i-C3H7C5H4)2WH2;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2008-07

3. Stacked tungsten–carbon targets;Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment;2004-03

4. Molecular Routes to Metal−Carbides, −Nitrides, and −Oxides. 3.1 Chemical Vapor Deposition Employing X3W⋮*CCMe3, Where X = CH2CMe3, OtBu, and OtBu-d9 and *C = 12C or 13C, and a Comparison with the Chemistry of (tBuO)3W⋮N;Chemistry of Materials;1998-08-15

5. Chemical vapor deposition of tungsten oxide;Applied Organometallic Chemistry;1998-03