Molecular Routes to Metal−Carbides, −Nitrides, and −Oxides. 3.1 Chemical Vapor Deposition Employing X3W⋮*CCMe3, Where X = CH2CMe3, OtBu, and OtBu-d9 and *C = 12C or 13C, and a Comparison with the Chemistry of (tBuO)3W⋮N-Reference-Cited by-同舟云学术

Molecular Routes to Metal−Carbides, −Nitrides, and −Oxides. 3.1 Chemical Vapor Deposition Employing X3W⋮*CCMe3, Where X = CH2CMe3, OtBu, and OtBu-d9 and *C = 12C or 13C, and a Comparison with the Chemistry of (tBuO)3W⋮N

Published:1998-08-15 Issue:9 Volume:10 Page:2365-2370
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Xue Ziling¹,Chuang Shiow-Huey¹,Caulton Kenneth G.¹,Chisholm Malcolm H.¹

Affiliation:

1. Department of Chemistry, Indiana University, Bloomington, Indiana 47405

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/cm970675%2B

Reference44 articles.

1. Molecular Routes to Metal Carbides, Nitrides, and Oxides. 2. Studies of the Ammonolysis of Metal Dialkylamides and Hexamethyldisilylamides

2. Surface organometallic chemistry in the chemical vapor deposition of aluminum films using triisobutylaluminum: .beta.-hydride and .beta.-alkyl elimination reactions of surface alkyl intermediates

3. Decomposition of trimethylaluminum on silicon(100)

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