Effect of selected atomic layer deposition parameters on the structure and dielectric properties of hafnium oxide films-Reference-Cited by-同舟云学术

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Effect of selected atomic layer deposition parameters on the structure and dielectric properties of hafnium oxide films

Published:2004-11 Issue:9 Volume:96 Page:5298-5307
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Kukli Kaupo,Aarik Jaan,Ritala Mikko,Uustare Teet,Sajavaara Timo,Lu Jun,Sundqvist Jonas,Aidla Aleks,Pung Lembit,Hårsta Anders,Leskelä Markku

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.1796513

Reference50 articles.

1. Use of hafnia/silica multilayer coatings on large mirrors and polarizers for the National Ignition Facility

2. Morphology and crystallization kinetics in HfO2 thin films grown by atomic layer deposition

3. Microstructure and interfaces of HfO2 thin films grown on silicon substrates

4. Hot-carrier charge trapping and trap generation in HfO2 and Al2O3 field-effect transistors

5. Direct tunneling leakage current and scalability of alternative gate dielectrics

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1. Impact of Doped Hafnium Oxides on Memory Window and Low-Frequency Noise in Ferroelectric FETs;IEEE Transactions on Electron Devices;2024-07

2. DFT Study of Electronic, Optical, Thermoelectric, and Thermodynamic Properties of the HfO2 Material;Brazilian Journal of Physics;2024-03-28

3. Enhanced physical and electrical properties of HfO2 deposited by atomic layer deposition using a novel precursor with improved thermal stability;Surfaces and Interfaces;2023-11

4. Band offsets and point-defect charges of the aluminum and hafnium oxides in contact with the Cu(In,Ga)Se₂ chalcopyrite;Journal of Physics: Condensed Matter;2023-10-24

5. Surface Morphology and Optical Properties of Hafnium Oxide Thin Films Produced by Magnetron Sputtering;Materials;2023-07-29

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