Accurate argon cluster-ion sputter yields: Measured yields and effect of the sputter threshold in practical depth-profiling by x-ray photoelectron spectroscopy and secondary ion mass spectrometry-Reference-Cited by-同舟云学术

Accurate argon cluster-ion sputter yields: Measured yields and effect of the sputter threshold in practical depth-profiling by x-ray photoelectron spectroscopy and secondary ion mass spectrometry

Published:2013-09-28 Issue:12 Volume:114 Page:124313
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Cumpson Peter J.,Portoles Jose F.,Barlow Anders J.,Sano Naoko

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.4823815

Reference34 articles.

1. Sputtering Yields at Very Low Bombarding Ion Energies

2. A universal relation for the sputtering yield of monatomic solids at normal ion incidence

3. Materials processing by gas cluster ion beams

4. Gas-cluster ion-beam smoothing of chemo-mechanical-polish processed GaSb(100) substrates

5. The surface damage in titanium nitride associated with lateral sputtering by argon cluster ions

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