XPS depth profiling of functional materials: applications of ion beam etching techniques-Reference-Cited by-同舟云学术

XPS depth profiling of functional materials: applications of ion beam etching techniques

Published:2024 Issue:3 Volume:8 Page:715-731
ISSN:2052-1537
Container-title:Materials Chemistry Frontiers
language:en
Short-container-title:Mater. Chem. Front.

Author:

Li Dongying¹,Chen Yangfei¹,Zhou Chuanqiang²^ORCID,Shi Changrui¹,Xu Zhiqiang¹,Miao Zhengjie¹,Xi Zheng¹^ORCID,Han Jie¹^ORCID

Affiliation:

1. School of Chemistry and Chemical Engineering, Yangzhou University, Yangzhou, Jiangsu, 225002, P. R. China

2. Testing Center, Yangzhou University, Yangzhou, Jiangsu, 225002, P. R. China

Abstract

X-ray photoelectron spectroscopy depth profiling combined with ion beam etching methods is a primary tool to study the chemical composition of functional materials at different scales from the surface to the bulk.

Funder

National Natural Science Foundation of China

Publisher

Royal Society of Chemistry (RSC)

Subject

Materials Chemistry,General Materials Science

Link

http://pubs.rsc.org/en/content/articlepdf/2024/QM/D3QM01036H

Reference112 articles.

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3. X-ray photoelectron spectroscopy: Towards reliable binding energy referencing

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