Direct detection of H atoms in the catalytic chemical vapor deposition of the SiH4/H2 system
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1428800
Reference46 articles.
1. Formation of Silicon-Based Thin Films Prepared by Catalytic Chemical Vapor Deposition (Cat-CVD) Method
2. Catalytic Chemical Vapor Deposition (CTC-CVD) Method Producing High Quality Hydrogenated Amorphous Silicon
3. Production of high‐quality amorphous silicon films by evaporative silane surface decomposition
4. Deposition of device quality, lowHcontent amorphous silicon
5. Device-quality polycrystalline and amorphous silicon films by hot-wire chemical vapour deposition
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