Properties of rf-sputtered indium–tin-oxynitride thin films
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1582368
Reference38 articles.
1. New Catalysts for Hydroprocessing: Bimetallic Oxynitrides MI–MII–O–N (MI, MII=Mo, W, V, Nb, Cr, Mn, and Co)
2. Lithium silicon tin oxynitride (LiySiTON): high-performance anode in thin-film lithium-ion batteries for microelectronics
3. Structure of Zr2ON2 by Neutron Powder Diffraction: The Absence of Nitride–Oxide Ordering
4. Preparation of a new tetragonal copper oxynitride phase by reactive magnetron sputtering
5. Thermoelectric power, Hall coefficient, and structure properties of Ta thin films rf sputtered in Ar–N2–O2
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