Radio-frequency plasma potential variations originating from capacitive coupling from the coil antenna in inductively coupled plasmas
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.369700
Reference18 articles.
1. Novel radio‐frequency induction plasma processing techniques
2. The effect of radio frequency plasma processing reactor circuitry on plasma characteristics
3. Electrical characteristics and electron heating mechanism of an inductively coupled argon discharge
4. A simple analysis of an inductive RF discharge
5. Power transfer efficiency and mode jump in an inductive RF discharge
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