Thermal conductivity and diffusivity of free‐standing silicon nitride thin films
Author:
Publisher
AIP Publishing
Subject
Instrumentation
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1145989
Reference18 articles.
1. Silicon nitride films grown on silicon below 300 °C in low power nitrogen plasma
2. Insulation degradation and anomalous etching phenomena in silicon nitride films prepared by plasma-enhanced deposition
3. Low‐temperature direct nitridation of silicon in nitrogen plasma generated by microwave discharge
4. The electronic properties of plasma‐deposited films of hydrogenated amorphous SiNx(0
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